The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Sep. 20, 2024
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Mohit Lamba, New Delhi, IN;

Anupama S, Chennai, IN;

Avani Rao, Bangalore, IN;

Srenivas Varadarajan, Bangalore, IN;

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01); G06T 11/00 (2026.01); G06V 10/25 (2022.01); G06V 10/44 (2022.01); G06V 10/75 (2022.01);
U.S. Cl.
CPC ...
G06T 17/00 (2013.01); G06T 11/00 (2013.01); G06V 10/25 (2022.01); G06V 10/44 (2022.01); G06V 10/751 (2022.01);
Abstract

Techniques and systems are described for image generation. For instance, a process can include obtaining a first image, wherein the first image is associated with a first image domain; converting, using a machine learning (ML) model, the first image into a second image domain to generate a second image; generating a first set of domain agnostic features for the first image; generating a second set of domain agnostic features for the second image; determining a loss value based on a comparison of the first set of domain agnostic features and the second set of domain agnostic features; and adjusting the ML model based on the loss value. The process can further include generating a third image in the second image domain based the adjusted ML model (e.g., based on an additional image in the first image domain using the adjusted/trained ML model).


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