The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Aug. 19, 2021
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

Zijia Wang, WeiFang, CN;

Jiacheng Ni, Shanghai, CN;

Wenbin Yang, Shanghai, CN;

Zhen Jia, Shanghai, CN;

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 18/213 (2023.01); G06F 18/22 (2023.01); G06N 3/045 (2023.01); G06N 20/00 (2019.01); G06V 10/42 (2022.01); G06V 10/82 (2022.01);
U.S. Cl.
CPC ...
G06F 18/213 (2023.01); G06F 18/22 (2023.01); G06N 20/00 (2019.01);
Abstract

A method in an illustrative embodiment includes: determining, based on a set of sample features extracted from an input sample by a feature extraction model, a confidence level of the input sample and a similarity degree among the set of sample features; determining a first loss based on the confidence level, the set of sample features, and label information for the input sample, the first loss being related to the quality of the label information; determining a second loss based on the similarity degree among the set of sample features, the second loss being related to the quality of the set of sample features; and training the feature extraction model based on the first loss and the second loss.


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