The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Jun. 20, 2023
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Katsuhiro Komuro, Osaka, JP;

Koji Ichikawa, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 303/32 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 303/32 (2013.01); G03F 7/0397 (2013.01); G03F 7/40 (2013.01);
Abstract

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: wherein Q, Q, Rand Reach represent a hydrogen atom, a fluorine atom, an alkyl group, etc.; z represents an integer of 0 to 6; Xrepresents *—CO—O—, *—O—CO—, etc.; Land Leach represent a single bond or an aliphatic hydrocarbon group; Arrepresents an aromatic hydrocarbon group or a heterocyclic aromatic hydrocarbon group; Rrepresents *—O—R, *—O—CO—R, etc., and Rrepresents an acid-labile group; Rrepresents a halogen atom, a haloalkyl group, or a hydrocarbon group; and m4 represents an integer of 0 to 8; and Zrepresent an organic cation.


Find Patent Forward Citations

Komuro, Katsuhiro. (2026). Salt, acid generator, resist composition and method for producing resist pattern (U.S. Patent No. 12704781). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12704781

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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