The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Jul. 23, 2024
Applicant:

Saudi Arabian Oil Company, Dhahran, SA;

Inventors:

Remi Mahfouz, Dhahran, SA;

Konstantin Novoselov, Singapore, SG;

Abdullah Alshahrani, Dammam, SA;

Nada Qari, Dammam, SA;

Noor Alsakhin, Al Qatif, SA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 32/184 (2017.01); B05D 1/00 (2006.01); B05D 3/04 (2006.01); B05D 3/06 (2006.01);
U.S. Cl.
CPC ...
C01B 32/184 (2017.08); B05D 1/005 (2013.01); B05D 3/0493 (2013.01); B05D 3/06 (2013.01); C01P 2002/82 (2013.01);
Abstract

A method for synthesizing graphene includes depositing pitch on a substrate to provide a pitch sample, and pyrolyzing at least a portion of the pitch sample with a laser, thereby forming graphene. A method for upgrading pitch includes providing a pitch sample under vacuum, and irradiating the pitch with a laser to form an upgraded pitch product. A system for synthesizing graphene includes a pitch deposition system configured to deposit pitch on a substrate to form a deposited pitch sample, and a laser irradiation system. The laser irradiation system includes a laser comprising an outlet for a beam of light, and a substrate holding area in line with the outlet of the laser. The laser irradiation system is capable of transforming at least a portion of the deposited pitch sample to form graphene.


Find Patent Forward Citations

Loading…