The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

Sep. 15, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jaeean Lee, Suwon-si, KR;

Dahee Kim, Suwon-si, KR;

Taehoon Lee, Suwon-si, KR;

Gyujin Choi, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 23/31 (2006.01); H01L 23/498 (2006.01); H10W 70/685 (2026.01); H10W 74/10 (2026.01); H10W 90/00 (2026.01); H10W 70/65 (2026.01); H10W 72/00 (2026.01); H10W 72/90 (2026.01);
U.S. Cl.
CPC ...
H10W 70/685 (2026.01); H10W 74/117 (2026.01); H10W 90/401 (2026.01); H10W 70/65 (2026.01); H10W 72/01935 (2026.01); H10W 72/884 (2026.01); H10W 72/922 (2026.01); H10W 72/927 (2026.01); H10W 72/952 (2026.01); H10W 74/10 (2026.01); H10W 90/724 (2026.01); H10W 90/732 (2026.01); H10W 90/734 (2026.01); H10W 90/754 (2026.01); H10W 90/794 (2026.01);
Abstract

An upper redistribution wiring layer of a semiconductor package includes a protective layer provided on at least one upper insulating layer and having an opening that exposes at least a portion of an uppermost redistribution wiring among second redistribution wirings, and a bonding pad provided on the uppermost redistribution wiring through the opening. The bonding pad includes a first plating pattern formed on the uppermost redistribution wiring, the first plating pattern including a via pattern provided in the opening and a pad pattern formed on the via pattern to be exposed from the opening, a second plating pattern on the second plating pattern, and a third plating pattern on the second plating pattern.


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