The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

May. 19, 2023
Applicant:

Foxsemicon Integrated Technology, Inc., Miao-Li Hsien, TW;

Inventors:

Chun-Chung Chen, Miaoli Hsien, TW;

Yu-Wei Wu, New Taipei, TW;

Chun-Kai Huang, Miaoli Hsien, TW;

Tang-Yu Chang, Miaoli Hsien, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); H10P 72/10 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0616 (2026.01); H10P 72/0602 (2026.01); H10P 72/1916 (2026.01); H10P 72/1918 (2026.01); H10P 72/1922 (2026.01); H10P 72/1926 (2026.01);
Abstract

A system for storing wafer is provided. The system includes a wafer box, an installing member, a detection tube, a control unit, and a detection unit. The wafer box includes an outlet connector and an inlet connector extending a wall of the wafer box. The installing member covers the wafer box to form a sealed receiving room. Two ends of the detection tube are coupled to the outlet connector and the inlet connector. The control unit are configured to output a first control signal to the detection unit. The detection unit includes a first sensor arranged in the detection tube. The first sensor is configured to detect a property of gas to obtain data of an environment where the wafer is stored upon the first control signal. A related system for monitoring pollution of wafer is also provided.


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