The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Nov. 22, 2022
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Shinichi Shudo, Saitama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0432 (2026.01); H10P 72/0434 (2026.01); H10P 72/0602 (2026.01);
Abstract
A processing method for a substrate processing apparatus including a chamber in which a heating plate configured to heat a substrate placed on the heating plate is located including heating the heating plate to a first temperature, cooling the heating plate to a second temperature from the first temperature, supplying dry gas into the chamber during the heating and the cooling, and carrying in the substrate onto the heating plate after the cooling.
Shudo, Shinichi. (2026). Substrate processing method and substrate processing apparatus (U.S. Patent No. 12701951). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12701951
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile