The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

Apr. 01, 2024
Applicant:

Ibiden Co., Ltd., Ogaki, JP;

Inventors:

Masashi Kuwabara, Ibi-gun, JP;

Susumu Kagohashi, Ogaki, JP;

Assignee:

IBIDEN CO., LTD., Ogaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/11 (2006.01); H05K 1/02 (2006.01); H05K 1/09 (2006.01); H05K 3/00 (2006.01); H05K 3/10 (2006.01); H05K 3/42 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
H05K 1/116 (2013.01); H05K 1/0242 (2013.01); H05K 1/09 (2013.01); H05K 3/002 (2013.01); H05K 3/0035 (2013.01); H05K 3/0041 (2013.01); H05K 3/108 (2013.01); H05K 3/423 (2013.01); H05K 1/0306 (2013.01); H05K 1/0373 (2013.01); H05K 2201/0209 (2013.01); H05K 2201/0338 (2013.01); H05K 2201/096 (2013.01); H05K 2203/0723 (2013.01);
Abstract

A wiring substrate includes a core substrate having a through-hole conductor, a resin insulating layer formed on the core substrate, a conductor layer formed on the insulating layer and including a seed layer and an electrolytic plating layer, and a via conductor formed in the insulating layer. The via conductor electrically connects the through-hole conductor and conductor layer. The via conductor includes the seed layer and electrolytic plating layer extending from the conductor layer. The core substrate includes a glass substrate and has a through hole penetrating through the glass substrate. The through-hole conductor is formed in the through hole. The seed layer is covering inner wall surface of the insulating layer in opening in which the via conductor is formed. The seed layer has a first portion and a second portion electrically connected to the first portion. That part of the first portion is formed on the second portion.


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