The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

Apr. 05, 2022
Applicant:

Asm America, Inc., Phoenix, AZ (US);

Inventor:

Imran Ahmed Bhutta, Moorestown, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/505 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01); C23C 16/505 (2013.01); C23C 16/52 (2013.01); H01J 37/32091 (2013.01);
Abstract

In one embodiment, an RF impedance matching circuit is disclosed. The matching circuit includes a series electronically variable capacitor (EVC) having first fixed capacitors. Each of the first fixed capacitors has a corresponding switch for switching in and out the fixed capacitor to alter the series variable capacitance. Each switch includes one or more diodes. A first inductor has a first terminal electrically coupled to the common ground and a second terminal electrically coupled between the RF input and the RF output. A control circuit determines a first parameter related to the plasma chamber while the RF source is providing the RF signal to the RF input. While the RF signal continues to be provided to the RF input, the control circuit alter the series variable capacitance based on the determined first parameter. The alteration causes RF power reflected back to the RF source to decrease.


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