The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Aug. 12, 2025
Jupiter Volta Inc., Berkeley, CA (US);
Jeremy Scholz, Berkeley, CA (US);
Alexander Sherman, Berkeley, CA (US);
David Berlin, Richmond, CA (US);
Aviv Zohman, Berkeley, CA (US);
Jerry Chien, Walnut Creek, CA (US);
Matthew Robinson, Orinda, CA (US);
Megumi Hora, Berkeley, CA (US);
JUPITER VOLTA INC., Berkeley, CA (US);
Abstract
A plasma processing method includes driving electric current through a Z-pinch plasma column within an atmospheric isolation device to produce a Lorentz force on the Z-pinch plasma column. Radiofrequency (RF) energy is supplied to the Z-Pinch plasma column with one or more RF generators. One or more RF applicators direct RF energy from the one or more RF generators toward the Z-pinch plasma column in a direction generally perpendicular to the direction of the electric current through the Z-pinch plasma column. One or more RF distributors distribute the RF energy to the one or more RF applicators.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile