Substrate processing apparatus, substrate processing method, training data generation method, training method, training device, trained model creation method, and trained model

Abstract

A substrate processing apparatus includes a substrate holding section, a chemical liquid supply section, a substrate information acquiring section, a chemical liquid processing condition information acquiring section, and a controller. The substrate information acquiring section acquires substrate information including hardened layer thickness information indicating a thickness of a hardened layer in a resist layer of a processing target substrate or ion implantation condition information indicating a condition for ion implantation by which the hardened layer has been formed in the resist layer. The chemical liquid processing condition information acquiring section acquires based on the substrate information chemical liquid processing condition information indicating a chemical liquid processing condition for the processing target substrate from a trained model. The controller controls the substrate holding section and the chemical liquid supply section to perform processing with a chemical liquid on the processing target substrate based on the chemical liquid processing condition information.