The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Feb. 03, 2024
Nanoscribe Holding Gmbh, Eggenstein-Leopoldshafen, DE;
Marc Hippler, Eggenstein-Leopoldshafen, DE;
Michael Thiel, Karlsruhe, DE;
Nanoscribe Holding GmbH, Eggenstein-Leopoldshafen, DE;
Abstract
A laser lithography device for producing a three-dimensional structure in a lithographic material comprising a laser source for emitting a laser writing beam and a lens for focusing the laser writing beam in a focus region. The lens has an optical terminating element. Furthermore, the laser lithography device comprises a scanning device for displacing the focus region of the laser writing beam relative to the lithographic material and a protection device for preventing contact between the optical terminating element and the lithographic material. The protection device is arranged on the optical terminating element.