The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

Aug. 25, 2023
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Jun Komori, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70808 (2013.01); G03F 7/70058 (2013.01);
Abstract

A substrate processing apparatus includes a cup, an exhaust duct, a mist collecting member and a lid portion. The cup surrounds a substrate being processed with use of a processing liquid. The exhaust duct has an opening in a portion not overlapping with the cup in a plan view and forms an exhaust flow path for exhausting a gas in the cup. The mist collecting member is provided at a position overlapping with the opening and collects mist of the processing liquid in the exhaust duct. The lid portion closes the opening of the exhaust duct.


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Komori, Jun. (2026). Substrate processing apparatus (U.S. Patent No. 12699327). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12699327

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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