The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Apr. 03, 2022
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Mun Ja Kim, Hwaseong-si, KR;
Ji-Beom Yoo, Seoul, KR;
Qicheng Hu, Suwon-si, KR;
Changyoung Jeong, Yongin-si, KR;
Ki-Bong Nam, Suwon-si, KR;
Jin-Ho Yeo, Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01); C23C 16/02 (2006.01); C23C 16/26 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); C23C 16/0272 (2013.01); C23C 16/26 (2013.01); C23C 16/50 (2013.01);
Abstract
A method for manufacturing a pellicle according to the technical idea of the present invention includes preparing a support substrate, forming a catalyst layer including nickel (Ni) in which one selected from a (110) plane and a (100) plane is a dominant crystal plane, on the support substrate, and performing a chemical vapor deposition process on the catalyst layer at about 1050° C. or less to form a membrane having a graphite layer.