The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

Sep. 12, 2024
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Mohammadreza Malek-Mohammadi, Solna, SE;

Behnaz Rezaei, San Diego, CA (US);

Saeed Dabbaghchian, Bromma, SE;

Senthil Kumar Yogamani, San Diego, CA (US);

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01C 21/00 (2006.01); G06T 11/23 (2026.01); G06T 11/60 (2006.01);
U.S. Cl.
CPC ...
G01C 21/3819 (2020.08); G01C 21/3837 (2020.08); G06T 11/23 (2026.01); G06T 11/60 (2013.01);
Abstract

Certain aspects of the present disclosure provide a method for generating a map. A method generally includes obtaining sensor data from one or more sensors, the sensor data corresponding to an environment comprising one or more features including a first feature having one or more changes in curvature; inputting the sensor data to a map generation model; and obtaining as output from the map generation model a vectorized map of the one or more features of the environment, wherein the vectorized map represents the first feature as a polyline comprising a plurality of line segments, wherein a comparison of changes of slope between consecutive line segments of the polyline to slopes of the plurality of line segments of the polyline satisfies a threshold.


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