The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

May. 06, 2021
Applicants:

Koken Ltd., Tokyo, JP;

Seiji Taguchi, Tokyo, JP;

Shingo Ishikawa, Tokyo, JP;

Inventors:

Seiji Taguchi, Tokyo, JP;

Shingo Ishikawa, Tokyo, JP;

Assignee:

KOKEN LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41D 13/11 (2006.01); A62B 23/02 (2006.01);
U.S. Cl.
CPC ...
A41D 13/1107 (2013.01); A41D 13/1161 (2013.01); A62B 23/025 (2013.01);
Abstract

A mask includes a filter portion that is formed of an air-permeable sheet material and covers at least a nose and a mouth in wearing; a substantially annular face-contacting body that is joined to the filter portion, and is in contact with at least a vicinity of the nose and a vicinity of the mouth on a face in wearing; and a hook string to be hooked around either a head or an ear so that the filter portion and the face-contacting body are worn to the face. Here, a protrusion portion is arranged at least at a part of the face-contacting body to be in contact with at least a vicinity of the nose on the face in wearing to the face and press the filter portion to form a three-dimensional shape allowing the filter portion to conform to unevenness of the face.


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