The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2026

Filed:

Sep. 16, 2022
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Kana Tahara, Kyoto, JP;

Masaki Inaba, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10W 20/00 (2026.01); H10P 95/00 (2026.01);
U.S. Cl.
CPC ...
H10W 20/062 (2026.01); H10P 95/04 (2026.01);
Abstract

An etching liquid is supplied to a principal surface of a substrate that has the principal surface on which a processing object layer having a plurality of crystal grains is exposed (first etching step). A polymer-containing liquid containing a polymer is supplied to the principal surface of the substrate after the first etching step, and a polymer layer at least portion of which is embedded in a crystal grain boundary which is a boundary of the crystal grains is formed (polymer layer forming step). The processing object layer is etched by supplying an etching liquid to the principal surface of the substrate after the polymer layer forming step (second etching step).


Find Patent Forward Citations

Tahara, Kana. (2026). Substrate processing method (U.S. Patent No. 12696743). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12696743

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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