The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2026

Filed:

Oct. 26, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

William H. Leavitt, Haverhill, MA (US);

William Herron Park, Jr., Marblehead, MA (US);

Jason M. Schaller, Austin, TX (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 7/02 (2006.01); H05H 9/00 (2006.01);
U.S. Cl.
CPC ...
H05H 7/02 (2013.01); H05H 9/00 (2013.01); H05H 2007/025 (2013.01); H05H 2277/12 (2013.01);
Abstract

An RF resonator cavity that includes a resonator coil is disclosed. Unlike traditional RF resonator cavities, no sulfur hexafluoride is used in this cavity. Rather, the volume of the RF resonator cavity is pumped to vacuum conditions. This may be done using a vacuum system, or by hermetically sealing the cavity. This approach eliminates the use of a potent greenhouse gas, while maintaining the integrity of the cavity. Specifically, the dielectric strength of the vacuum is greater than that of sulfur hexafluoride. This RF resonator cavity may be deployed in a linear accelerator used to implant ions into a workpiece.


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