The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Dec. 29, 2025
Clocktower Engineering Inc., Beverly, MA (US);
William Davis Lee, Rockport, ME (US);
Mark R. Amato, Swampscott, MA (US);
Robert Amato, Bedford, MA (US);
Clocktower Engineering Inc., Beverly, MA (US);
Abstract
A device for electrostatic deflection of an ion beam is provided. The device comprises an entrance aperture, an exit aperture, and a first electrode set disposed above an ion beam path with a first entrance-end electrode positioned closest to the entrance aperture and a first exit-end electrode positioned closest to the exit aperture. The device further comprises a second electrode set disposed below the ion beam path with a second entrance-end electrode positioned closest to the entrance aperture and a second exit-end electrode positioned closest to the exit aperture. The first entrance-end electrode is biased to within 5% of an electric potential to which the first exit-end electrode is biased, the second entrance-end electrode is biased to within 5% of an electric potential to which the second exit-end electrode is biased, and the first electrode set comprises a different number of electrodes than the second electrode set.