Pattern generation device, pattern generation method and non-transitory computer-readable medium

Abstract

A pattern generation device includes a memory and a processor coupled to the memory. The processor is configured to generate pattern data corresponding to a pattern of a metal layer based on a generation condition, determine whether the generated pattern data satisfies a predetermined condition, return to generate the pattern data when the predetermined condition is not satisfied, calculate a characteristic of the pattern or an element or circuit having the pattern when a high-frequency signal is inputted to a first portion and a high-frequency signal is outputted from a second portion by performing an electromagnetic field analysis based on the pattern data when the predetermined condition is satisfied, determine whether the calculated characteristic is within a target range, change the generation condition when the calculated characteristic is not within the target range, and return to generate the pattern data after changing the generation condition.