The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Jan. 28, 2025
Lingnan University, Hong Kong, CN;
City University of Hong Kong, Hong Kong, CN;
Lingnan University, Hong Kong, CN;
City University of Hong Kong, Hong Kong, CN;
Abstract
A method for monitoring a nonlinear dynamic process and a computing system are provided. The method includes training a model based on sample data, wherein the model comprises: a first layer, wherein the first layer is configured to linearize the sample data using one or more dimension lifting techniques; a second layer, wherein the second layer is configured to extract reduced-dimension dynamic latent variables (DLVs) from the linearized sample data using a reduced-dimension model; and a third layer, wherein the third layer is configured to parameterize the extracted reduced-dimension DLVs using a latent state space model; and inputting data from the nonlinear dynamic process into the trained model for monitoring the nonlinear dynamic process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile