The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Apr. 29, 2022
Semes Co., Ltd., Chungcheongnam-do, KR;
Hae Won Choi, Daejeon, KR;
Joon Ho Won, Gyeonggi-do, KR;
Koriakin Anton, Chungcheongnam-do, KR;
Ki Hoon Choi, Chungcheongnam-do, KR;
Eung Su Kim, Gyeonggi-do, KR;
Pil Kyun Heo, Gyeonggi-do, KR;
Min Woo Kim, Seoul, KR;
Jin Yeong Sung, Gyeonggi-do, KR;
Hyo Soo Kim, Gyeonggi-do, KR;
SEMES CO., LTD., Chungcheongnam-do, KR;
Abstract
There are provided an apparatus and a method for providing a substrate, which can suppress any additional reaction between a developing solution and a photoresist (PR) film and prevent any PR remnants from being generated from such additional reaction. The method includes: supplying an organic developing solution onto a substrate while rotating the substrate at a first revolutions per minute (rpm); substituting the organic developing solution with a nonpolar rinse solution by supplying the nonpolar rinse solution onto the substrate while rotating the substrate at a second rpm, which is lower than the first rpm; continuing to supply the nonpolar rinse solution while rotating the substrate at a third rpm, which is higher than the second rpm; and continuing to supply the nonpolar rinse solution while rotating the substrate at a fourth rpm, which is between the second rpm and the third rpm.