The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2026

Filed:

Nov. 10, 2023
Applicant:

Meta Platforms Technologies, Llc, Menlo Park, CA (US);

Inventors:

Robin Sharma, Woodinville, WA (US);

Carl Chancy, Seattle, WA (US);

Afsoon Jamali, Issaquah, WA (US);

Kurt Jenkins, Sammamish, WA (US);

Yang Zheng, Bothell, WA (US);

Rongzhi Huang, Sammamish, WA (US);

Timothy Louis Wong, West St. Paul, MN (US);

Evan Mark Richards, Phoenix, AZ (US);

Assignee:

Meta Platforms Technologies, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02C 7/02 (2006.01); G02B 27/00 (2006.01); G02B 27/01 (2006.01); G02C 7/08 (2006.01);
U.S. Cl.
CPC ...
G02C 7/027 (2013.01); G02B 27/0093 (2013.01); G02B 27/0172 (2013.01); G02C 7/083 (2013.01); G02B 2027/0178 (2013.01); G02C 2202/12 (2013.01);
Abstract

An apparatus includes a partial reflector, a first lens, a reflective polarizer, and a second lens. The second lens includes a first part and a second part coupled to the first part with at least one optical property designed to correct a specific user's refractive error. Various other apparatuses, systems, and methods of manufacture are also disclosed.


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