The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Feb. 28, 2022
University of Kansas, Lawrence, KS (US);
Christian Curtis Jones, Manhattan, KS (US);
Lumumba Harnett, Lawrence, KS (US);
Charles Andrew Mohr, Beavercreek, OH (US);
Shannon David Blunt, Shawnee, KS (US);
University of Kansas, Lawrence, KS (US);
Abstract
The present application provides techniques for reducing noise in sensor-based systems, such as radar systems. In particular, techniques referred to background supplemental cancellation (BaSC) and background supplemental loading (BaSL) are disclosed and facilitate improved detection of moving targets in certain types of radar systems, such as radar systems based on Reiterative minimum-mean square error (RMMSE) estimation formulations. The BaSC technique may utilize a hard cancellation, where clutter cancellation is performed prior to estimation, while the BaSL technique may utilize a 'soft' cancellation technique whereby clutter cancellation is performed jointly with estimation. The clutter cancellation provided via the BaSC and BaSL techniques improves the accuracy of the radar system with respect to performing target detection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile