The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2026

Filed:

Mar. 31, 2022
Applicant:

Hoya Corporation, Tokyo, JP;

Inventors:

Shuhei Azuma, Hung Yen Province, VN;

Toshio Takizawa, Tokyo, JP;

Assignee:

HOYA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/02 (2006.01);
U.S. Cl.
CPC ...
C03C 15/02 (2013.01); C03C 2203/50 (2013.01);
Abstract

A method for manufacturing an annular glass substrate includes: forming, on a glass blank, a separation line that includes a plurality of defects along a predetermined circle by irradiating a surface of the glass blank with a laser beam along the circle; and separating a portion outside the separation line of the glass blank on which the separation line was formed from a portion inside the separation line by heating the portion outside the separation line at a higher temperature than the portion inside the separation line. The separation line includes: a first region in which the defects are periodically formed and an interval between a pair of adjacent defects is a first interval; and a second region in which an interval between a pair of adjacent defects is shorter than the first interval.


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