The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Aug. 10, 2023
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Yosuke Maruyama, Yokkaichi Mie, JP;

Takahiro Kawata, Yokkaichi Mie, JP;

Satoshi Nakaoka, Yokkaichi Mie, JP;

Assignee:

KIOXIA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); H10P 50/28 (2026.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0426 (2026.01); H10P 50/283 (2026.01); H10P 72/7606 (2026.01); H10P 72/7618 (2026.01); H10P 72/7621 (2026.01);
Abstract

A substrate processing apparatus includes: a processing tank configured to store a solution capable of processing a substrate; a supply configured to supply the solution to the processing tank; a holding member having an openable and closable support portion capable of sandwiching the substrate, the holding member configured to hold the substrate in the processing tank; a first drive mechanism configured to move the holding member in a first direction along a substrate surface; and a guide disposed between the support portion and the supply in the processing tank and configured to guide a rotational movement of the substrate in the first direction.


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