The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Dec. 23, 2021
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Syed-Sarwar Imam, Hsinchu City, TW;

Chia-Hao Lee, Jhubei City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/66 (2025.01); H10D 30/01 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 30/668 (2025.01); H10D 30/0297 (2025.01); H10D 64/514 (2025.01); H10D 64/518 (2025.01);
Abstract

A semiconductor device, including: a substrate having a first conductive type, an epitaxial layer disposed on the substrate, a doped region disposed in the epitaxial layer, and a gate electrode disposed through the doped region and extending into the epitaxial layer. The epitaxial layer has the first conductive type, and the doped region has a second conductive type different from the first conductive type. The gate electrode includes a first structure having a first dimension, and a second structure above the first structure. The second structure includes a main portion and a protruding portion below the main portion, wherein the main portion has a second dimension larger than the first dimension, and the protruding portion has the first dimension.


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