The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Mar. 22, 2022
Applicant:

Sharp Kabushiki Kaisha, Sakai City, JP;

Inventors:

Tomoki Yoshimura, Sakai City, JP;

Toshizo Nogami, Sakai City, JP;

Takahisa Fukui, Sakai City, JP;

Shoichi Suzuki, Sakai City, JP;

Daiichiro Nakashima, Sakai City, JP;

Wataru Ouchi, Sakai City, JP;

Huifa Lin, Sakai City, JP;

Assignee:

SHARP KABUSHIKI KAISHA, Sakai City, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04W 74/0833 (2024.01); H04L 1/00 (2006.01);
U.S. Cl.
CPC ...
H04W 74/0833 (2013.01); H04L 1/0009 (2013.01);
Abstract

A first PRACH resource type is selected in a case that a value related to a received power of a downlink signal is lower than a threshold, a second PRACH resource type is selected in a case that the value related to the received power is larger than or equal to the threshold, an uplink grant included in a PDSCH is interpreted using a first rule in a case that the PRACH is transmitted in the first PRACH resource type, the uplink grant included in the PDSCH is interpreted using a second rule in a case that the PRACH is transmitted in the second PRACH resource type, and the uplink grant included in the PDSCH is interpreted using the second rule in a case that the threshold is not configured in an RRC layer processing circuitry.


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