The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Mar. 31, 2023
Mediatek Inc., Hsinchu City, TW;
Yu-Cheng Lin, Hsinchu City, TW;
Chun-Chia Chen, Hsinchu City, TW;
Tzu-Der Chuang, Hsinchu City, TW;
Chih-Wei Hsu, Hsinchu City, TW;
Ching-Yeh Chen, Hsinchu City, TW;
MEDIATEK INC., Hsinchu City, TW;
Abstract
A method and apparatus for Overlapped Boundary Motion Compensation (OBMC). A current MV (Motion Vector) for the current block/subblock is determined and a neighbouring MV for a neighbouring block/subblock associated with the current block/subblock is determined. A number of lines to be applied for OBMC (Overlapped Block Motion Compensation), one or more weightings associated with the OMBC for the number of lines, or both are determined according to one or more boundary matching costs between the current block/subblock and the neighbouring block/subblock, MV difference between the current MV and the neighbouring MV, or predicted luminance data associated with the current block/subblock. The OBMC is applied to at least one of the current block/subblock and the neighbouring block/subblock according to OBMC parameters comprising the number of lines, said one or more weightings, or both.