The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Jul. 07, 2023
Applicant:

Lumentum Operations Llc, San Jose, CA (US);

Inventors:

Richa Dubey, Milpitas, CA (US);

Matthew Glenn Peters, Menlo Park, CA (US);

Assignee:

Lumentum Operations LLC, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/183 (2006.01); H01S 5/068 (2006.01); H01S 5/10 (2021.01);
U.S. Cl.
CPC ...
H01S 5/18338 (2013.01); H01S 5/06821 (2013.01); H01S 5/1096 (2013.01); H01S 5/18394 (2013.01);
Abstract

A vertical-cavity surface-emitting laser (VCSEL) may include a substrate, a first mirror structure, and a cavity region to generate light. The cavity region may cause a resonance wavelength of a first portion of the light and a resonance wavelength of a second portion of the light to be offset from a gain peak of the VCSEL, where the first portion has a first polarization and the second portion has a second polarization, and an offset of the resonance wavelength of the first portion is different from an offset of the resonance wavelength of the second portion. The VCSEL may include a confinement aperture that has an asymmetric shape to cause spectral separation of the resonance wavelength of the first portion and the resonance wavelength of the second portion. The VCSEL may include a second mirror structure and one or more layers that form an output aperture.


Find Patent Forward Citations

Dubey, Richa. (2026). Vertical-cavity surface-emitting laser with asymmetric aperture for improved polarization stability (U.S. Patent No. 12689182). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12689182

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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