The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Feb. 22, 2021
Hitachi High-tech Corporation, Tokyo, JP;
Motohiro Takahashi, Tokyo, JP;
Masaki Mizuochi, Tokyo, JP;
Shuichi Nakagawa, Tokyo, JP;
Tomotaka Shibazaki, Tokyo, JP;
Hironori Ogawa, Tokyo, JP;
Takanori Kato, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
The present invention provides: a stage device that can suppress bending deformation of a mirror, and that can reduce the positioning error of a stage by reducing the measurement error of the position of the stage; and a charged particle beam device comprising this stage device. The stage device according to the present invention comprises: a table () on which a sample () is placed; a bar mirror () installed on the table (); a laser interferometer () that irradiates the bar mirror () with laser light and receives reflected light from the bar mirror (), thereby measuring the position of the table (); a drive mechanism () that moves the table (); and a plurality of elastic members () installed between the bar mirror () and the table ().