The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Jan. 18, 2023
Applicant:

Veeva Systems Inc., Pleasanton, CA (US);

Inventors:

Asaf Roll, Richmond Hill, CA;

Ying Zhuo Wang, Toronto, CA;

Justin Yuping Lai, Markham, CA;

Assignee:

Veeva Systems Inc., Pleasanton, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G16H 15/00 (2018.01); G16H 40/67 (2018.01); G16H 70/40 (2018.01);
U.S. Cl.
CPC ...
G16H 15/00 (2018.01); G16H 40/67 (2018.01); G16H 70/40 (2018.01);
Abstract

A method for determining and indicating expectedness of an adverse event. The method includes receiving adverse event data associated with the adverse event. The method further includes determining an electronic reference document associated with the clinical study. The method further includes selecting the electronic reference document including a defined adverse reaction from the document repository. The defined adverse reaction includes an active start date. The method further includes generating a case dataset including at least a portion of the adverse event data. The method further includes determining the expectedness of the adverse event based on the defined adverse reaction of the electronic reference document and the adverse event data. The method further includes determining a submission timeframe associated with the case dataset based on the expectedness of the adverse event.


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