The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Jan. 24, 2024
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Amritam Sarcar, Sammamish, WA (US);
Andrew Stephen Zeigler, Redmond, WA (US);
Hitesh Kanwathirtha, Woodinville, WA (US);
Zachary Michael Murphy, Seattle, WA (US);
Javier Nisim Flores Assad, Bothell, WA (US);
Jeffrey Tzu Heng Lin, Redmond, WA (US);
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
Merge conflicts are identified when changes from two different developers are merged into a code base in a code repository. When the changes from the two different developers conflict with one another, a merge conflict is identified. A pattern resolution system identifies whether the merge conflict contains any of a plurality of different conflict patterns. If so, a pattern conflict resolver, corresponding to the identified conflict pattern, is applied to the merge conflict to automatically resolve the merge conflict. If none of the pattern resolvers are applied to the merge conflict, the merge conflict is provided to a large language model for resolution. The Large Language Model (LLM) generates a proposed conflict resolution. A normalized divergence distance metric is calculated for the proposed conflict resolution and compared to a set of threshold values. The proposed conflict resolution is determined to be valid based upon the comparison.