The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Aug. 11, 2023
Applicant:

Ichor Systems, Inc., Fremont, CA (US);

Inventors:

Sean Joseph Penley, Sparks, NV (US);

Michael Maeder, Riverview, FL (US);

Marcos E. Perez-Blanco, Sparks, NV (US);

Tyler James Wright, Reno, NV (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/06 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
G05D 7/0658 (2013.01); H10P 72/0404 (2026.01);
Abstract

Systems for processing articles are essential for semiconductor fabrication. In one method of controlling gas flow, a processing system is provided, the processing system having first and second fluid supplies. The first fluid supply is coupled to a first apparatus for controlling flow and the second fluid supply is coupled to the second apparatus for controlling flow. The first process fluid is then delivered to a process chamber via outlet of the first apparatus for controlling flow. The first process fluid is also bled via a bleed port of the first apparatus for controlling flow. The flow rate of the first process fluid through the bleed port is controlled at a first flow rate which is less than a first threshold.


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