The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Apr. 28, 2021
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Masaki Inaba, Kyoto, JP;

Masayuki Otsuji, Kyoto, JP;

Ayumi Higuchi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/4155 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G05B 19/4155 (2013.01); G06N 20/00 (2019.01); G05B 2219/45031 (2013.01);
Abstract

A substrate processing apparatus includes a substrate holder, a processing liquid supply section, an input information acquiring section, a sublimation drying process condition information acquiring section, and a controller. The input information acquiring section acquires input information including at least one of substrate information and processing liquid information. The sublimation drying process condition information acquiring section acquires, from a trained model based on the input information, sublimation drying process condition information indicating a sublimation drying process condition on a processing target substrate. The controller controls the substrate holder and the processing liquid supply section to perform a sublimation drying process on the process target substrate based on the sublimation drying process condition acquired in the sublimation drying process condition information acquiring section.


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