Immersion liquid supply system and immersion liquid flow field removal method therefor

Abstract

Disclosed are an immersion liquid supply system and an immersion flow field removal method thereof. The immersion liquid supply system comprises an immersion liquid supply source, a liquid supply valve and an immersion liquid suction assembly, wherein the liquid supply valve is connected to a main liquid injection port of an immersion liquid supply device by means of a tail end liquid supply flow path, and the immersion liquid suction assembly and the tail end liquid supply flow path form a fluid connection; once the liquid supply valve is closed, the immersion liquid suction assembly exerts a suction effect on residual immersion liquid in the tail end liquid supply flow path, so that the residual immersion liquid is kept in the tail end liquid supply flow path under the action of atmospheric pressure, or the residual liquid is discharged through the tail end liquid supply flow path, thereby preventing contamination and erosion caused by the leakage of the residual immersion liquid from the main liquid injection port to a lithography apparatus component, or further preventing the residual immersion liquid from contaminating and eroding the tail end liquid supply flow path and an immersion liquid supply recovery device. The amount of immersion liquid accumulated in the tail end liquid supply flow path is effectively reduced once an immersion flow field is removed to mitigate the contamination and erosion of the immersion liquid to the lithography apparatus component.