The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Mar. 20, 2023
Applicant:
Photronics, Inc., Brookfield, CT (US);
Inventors:
Christopher Progler, Plano, TX (US);
Young Mog Ham, Meridian, ID (US);
Assignee:
PHOTRONICS, INC., Brookfield, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/72 (2012.01);
U.S. Cl.
CPC ...
G03F 1/72 (2013.01);
Abstract
A method of manufacturing a photomask including the steps of providing a photomask blank, inspecting the photomask blank to determine presence of one or more defects in the photomask blank, wherein the one or more defects comprise one or more photomask substrate defects, and compensating for the one or more photomask substrate defects by roughening one or more surface portions of the photomask substrate.