The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Apr. 28, 2021
Applicant:

Poro Technologies Ltd, Cambridge, GB;

Inventors:

Tongtong Zhu, Cambridge, GB;

Yingjun Liu, Cambridge, GB;

Assignee:

Poro Technologies LTD, Cambridge, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 7/00 (2006.01); C25F 3/12 (2006.01); H10P 50/00 (2026.01);
U.S. Cl.
CPC ...
C25F 7/00 (2013.01); C25F 3/12 (2013.01); H10P 50/00 (2026.01);
Abstract

A wafer holder for holding a semiconductor wafer during electrochemical porosification with an electrolyte includes a housing for receiving the semiconductor wafer, an aperture in the housing, through which an upper surface of the semiconductor wafer is exposable to the electrolyte, a seal extending around the aperture, for preventing the ingress of electrolyte into the housing; and an electrical contact for making an electrical connection with the semiconductor wafer. A method of electrochemical porosification of a semiconductor wafer includes placing a semiconductor wafer in the wafer holder; immersing the housing in an electrolyte, so that the surface of the semiconductor wafer is exposed to electrolyte through the aperture; and applying a potential difference between the semiconductor wafer and the electrolyte.


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