The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Oct. 13, 2023
East China University of Science and Technology, Shanghai, CN;
Zhigang Zheng, Shanghai, CN;
Conglong Yuan, Shanghai, CN;
Jiajun Chen, Shanghai, CN;
Yuxing Zhan, Shanghai, CN;
Huixian Liu, Shanghai, CN;
EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY, Shanghai, CN;
Abstract
Provided are a twist-bend nematic (N) LC dimer-based material and use thereof, and an LC-based cholesteric heliconical (CH) material and use thereof. The NLC dimer-based material is at least one selected from the group consisting of CBnCB, CBnOCB, and CBOnOCB, with n being a positive integer of 3 to 15. Based on ultra-stable properties of the material, the disclosure further provides the LC-based CH material, which uses the LC dimer-based material as a key raw material and integrates a conventional nematic LC monomer material and a chiral molecule.