The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Oct. 19, 2021
Teknologian Tutkimuskeskus Vtt Oy, Espoo, FI;
Olli-Heikki Huttunen, Oulu, FI;
Jussi Hiltunen, Oulu, FI;
Jarno Petäjä, Oulu, FI;
Johanna Hiitola-Keinänen, Oulu, FI;
TEKNOLOGIAN TUTKIMUSKESKUS VTT OY, Espoo, FI;
Abstract
The present invention relates to roll-to-roll surface patterning by imprint method. A film of liquid phase resist is coated on a running web and subsequently brought into contact with a rolling replication tool with patterned features on its outer surface. In a simultaneous step, resist is 5 cured typically by heat or UV-light and patterned features on the rolling replication tool are replicated into the resist film during the contact with the replication tool. A major deficiency of conventional roll-to-roll imprinting is the generation of defects in the patterns due to trapped air. To overcome this limitation, the present invention describes a method and 10 apparatus to perform roll-to-roll imprinting under reduced-pressure or vacuum conditions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile