The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Feb. 10, 2023
Applicant:

Universiteit Twente, Enschede, NL;

Inventors:
Assignee:

Universiteit Twente, Enschede, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/00 (2006.01); A61F 9/00 (2006.01); A61M 5/30 (2006.01);
U.S. Cl.
CPC ...
A61B 5/442 (2013.01); A61B 5/0053 (2013.01); A61F 9/0008 (2013.01); A61M 5/30 (2013.01);
Abstract

The invention provides a method for determining a property of a target area of a material, wherein the target area has a size selected from the range of 100 μm-100 mm, wherein the method comprises: an exposure stage comprising providing a liquid jet to the target area, wherein the liquid jet has a jet velocity selected from the range of 2-150 m/s; a measurement stage comprising detecting a deformation of the material in the target area and providing a related signal; and an analysis stage comprising determining the property of the target area based on the related signal.


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Fernandez Rivas, David. (2026). Material characterization method (U.S. Patent No. 12685480). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12685480

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