The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

May. 18, 2021
Applicant:

Soitec, Bernin, FR;

Inventors:

Isabelle Bertrand, Bernin, FR;

Walter Schwarzenbach, Saint Nazaire les Eymes, FR;

Frédéric Allibert, Grenoble, FR;

Assignee:

Soitec, Bernin, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 90/00 (2026.01); H10W 10/10 (2026.01);
U.S. Cl.
CPC ...
H10P 90/1916 (2026.01); H10W 10/181 (2026.01);
Abstract

A method for manufacturing a semiconductor-on-insulator substrate for radiofrequency applications, comprises: providing a P-doped semiconductor donor substrate; forming a sacrificial layer on the donor substrate; implanting atomic species through the sacrificial layer so as to form in the donor substrate an area of embrittlement defining a thin semiconductor layer that is to be transferred; removing the sacrificial layer from the donor substrate after the implantation; providing a supporting semiconductor substrate having an electrical resistivity greater than or equal to 500 Ω·cm; forming an electrically insulating layer on the supporting substrate; bonding the donor substrate on the supporting substrate, the thin semiconductor layer and the electrically insulating layer being at the interface of the bonding; detaching the donor substrate along the area of embrittlement so as to transfer the thin semiconductor layer from the donor substrate onto the supporting substrate.


Find Patent Forward Citations

Loading…