The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Dec. 17, 2021
Fujifilm Corporation, Tokyo, JP;
Tetsuya Kamimura, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An object of the present invention is to provide a polishing liquid which reduces the occurrence of dishing on a surface to be polished of an object to be polished having a cobalt-containing film after polishing in a case where the polishing liquid is applied to CMP of the object to be polished. In addition, another object of the present invention is to provide a chemical mechanical polishing method using the above-mentioned polishing liquid. The polishing liquid of an embodiment of the present invention is a polishing liquid used for chemical mechanical polishing of an object to be polished having a cobalt-containing film, including colloidal silica, a nitrogen-containing aromatic heterocycle, and hydrogen peroxide, in which at least a specific nitrogen-containing aromatic heterocyclic compound (1), a specific nitrogen-containing aromatic heterocyclic compound (2) different from the nitrogen-containing aromatic heterocyclic compound (1) are included as the nitrogen-containing aromatic heterocyclic compound.