The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Apr. 20, 2023
Applicant:
Asm Ip Holding, B.v., Almere, NL;
Inventor:
Jan Deckers, Kessel-Lo, BE;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C30B 25/16 (2006.01); C30B 29/06 (2006.01); C30B 29/52 (2006.01); C30B 29/68 (2006.01); C30B 33/12 (2006.01); H01J 37/32 (2006.01); H10P 14/20 (2026.01); H10P 14/24 (2026.01);
U.S. Cl.
CPC ...
H10P 14/3252 (2026.01); C30B 25/165 (2013.01); C30B 29/06 (2013.01); C30B 29/52 (2013.01); C30B 29/68 (2013.01); C30B 33/12 (2013.01); H10P 14/24 (2026.01); H10P 14/3206 (2026.01); H10P 14/3211 (2026.01); H10P 14/3256 (2026.01); H10P 14/3406 (2026.01); H10P 14/3411 (2026.01); H10P 14/3458 (2026.01); H01J 37/321 (2013.01); H01J 2237/3321 (2013.01);
Abstract
Methods and systems for forming structures including a superlattice of silicon-containing epitaxial layers using nanoparticles. Exemplary methods can include forming nanoparticles in situ and depositing the nanoparticles onto a substrate surface to thereby form the epitaxial layers.
Deckers, Jan. (2026). Methods of forming superlattice structures using nanoparticles (U.S. Patent No. 12685041). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12685041
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile