The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

May. 27, 2022
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Wenjun Liao, Sunnyvale, CA (US);

Algird Michael Gudaitis, Fall City, WA (US);

Ruipeng Sun, Pleasanton, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 21/00 (2006.01); B81B 7/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
H03H 21/0021 (2013.01); B81B 7/008 (2013.01); G02B 26/0833 (2013.01); B81B 2201/042 (2013.01);
Abstract

The configuring of a micromirror to suppress a resonance of the micromirror. As part of the configuring process, the micromirror is subjected to multiple actuation frequencies, and the micromirror response is measured in response to at least some of these actuation frequencies. A resonant frequency of the micromirror is then determined using at least some of the measured mechanical responses. Then, depending on this determined resonant frequency of the micromirror, notch filter parameters are selected. There is more than one possibility for notch filter parameters, where the selected possibility depends on the determined resonant frequency. The notch filter is then configured with the selected notch filter parameters.


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