The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Dec. 24, 2021
Applicant:
National University of Singapore, Singapore, SG;
Inventor:
Jeroen Anton Van Kan, Singapore, SG;
Assignee:
NATIONAL UNIVERSITY OF SINGAPORE, Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/12 (2006.01); H01J 37/08 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/12 (2013.01); H01J 37/08 (2013.01); H01J 37/26 (2013.01); H01J 2237/0264 (2013.01); H01J 2237/082 (2013.01); H01J 2237/1207 (2013.01);
Abstract
An ion microscope, a method of constructing an ion microscope, and a method of aligning an ion beam in an ion microscope. The microscope comprises a nano-aperture ion source; and a focusing system; wherein the focusing system is configured for selectively coaxially focusing an ion beam generated from an electron beam ionizing an ionizing gas in the nano-aperture ion source and the electron beam.