The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Dec. 12, 2024
Amazon Technologies, Inc., Seattle, WA (US);
Houyu Zhang, Redmond, WA (US);
Seongjun Yun, Vancouver, CA;
Alejandro Ricardo Mottini D'oliveira, Seattle, WA (US);
Qingjun Cui, Sunnyvale, CA (US);
Theodoros Vasiloudis, Seattle, WA (US);
Xiang Song, Los Altos, CA (US);
AMAZON TECHNOLOGIES, INC., Seattle, WA (US);
Abstract
A large language model (LLM) may be used to generate an overall entity representation of an entity using an input that includes individual representations based on graph data, text data, and image data associated with the entity. Graph data that represents characteristics of the entity and types of relationships between the entity and other entities is used to generate a graph representation. Text associated with the entity is used to generate a text representation. Image data associated with the entity is used to generate an image representation. These representations are used to generate an input to the LLM, which is trained to generate an entity representation based on the input. The entity representation may be used by other models, such as to determine entities having similar or differing characteristics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile