The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Jul. 18, 2022
Applicants:

Samsung Display Co., Ltd., Yongin-si, KR;

Ltc Co., Ltd, Hwaseong-si, KR;

Inventors:

Jun Young Kim, Hwaseong-si, KR;

Gwui-Hyun Park, Hwaseong-si, KR;

Koichi Sugitani, Suwon-si, KR;

Hye In Kim, Hwaseong-si, KR;

Do Hyuk Im, Hwaseong-si, KR;

Saehee Han, Paju-si, KR;

Pil Soon Hong, Seoul, KR;

Hwa Young Kim, Hwaseong-si, KR;

Do Hyun Seo, Hwaseong-si, KR;

Ho Sung Choi, Hwaseong-si, KR;

Sung Goo Han, Hwaseong-si, KR;

Assignees:

Samsung Display Co., Ltd., Yongin-si, KR;

LTC Co., Ltd, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); G03F 7/0048 (2013.01); G03F 7/0395 (2013.01); G03F 7/0757 (2013.01); G03F 7/30 (2013.01);
Abstract

A photosensitive resin composition including a silsesquioxane-based copolymer obtained by copolymerizing a first monomer represented by Chemical Formula 1 (R—R—Si(R)), a second monomer represented by Chemical Formula 2 ((R)—Si(R)), a third monomer represented by Chemical Formula 3 (Si(R)), and a fourth monomer represented by Chemical Formula 4 ((R)—Si—R—Si—(R)) are provided.


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