The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Mar. 17, 2022
Applicant:
Kokusai Electric Corporation, Tokyo, JP;
Inventors:
Assignee:
Kokusai Electric Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/45563 (2013.01);
Abstract
There is provided a technique capable of effectively removing a residual element after a cleaning process. According to one aspect of the technique, there is provided a method of manufacturing a semiconductor device, including: (a) supplying a cleaning gas to at least one nozzle among a plurality of nozzles provided in a reaction tube after a substrate is processed in the reaction tube and unloaded out of the reaction tube; and (b) supplying a gas containing hydrogen and oxygen to the at least one nozzle after (a).
Quick Actions:
Hanashima, Takeo. (2026). Nozzle cleaning method, substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium (U.S. Patent No. 12680160). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12680160
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile