The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Nov. 07, 2022
Applicant:

Wabtec Hauts-de-france, Saint-Pierre-des-Corps CEDEX, FR;

Inventors:

Henri Guillaume Marie De Buretel De Chassey, Piossasco, IT;

Philippe Geoffroy, Ballan Mire, FR;

Santosh Reddy Sama, Erie, PA (US);

Brett Daniel Heher, Pittsburgh, PA (US);

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B60L 5/32 (2006.01); B60L 5/24 (2006.01); B60L 5/28 (2006.01);
U.S. Cl.
CPC ...
B60L 5/32 (2013.01); B60L 5/24 (2013.01); B60L 5/28 (2013.01); B60L 2200/26 (2013.01);
Abstract

A pantograph positioning system may include a contact strip, a main valve, a supply line, at least one feeder line, and a detection line. The contact strip may be fastened to a pantograph and equipped with a wear detection circuit supplied a fluid. The main valve may include a pilot chamber and a secondary chamber, which are separated by a membrane. The membrane may be movable between a closed position, in which the membrane blocks an outlet aperture of the secondary chamber, and an open position, in which the membrane does not block the outlet aperture, allowing evacuation of the fluid. The supply line may supply the fluid to the secondary chamber of the main valve. The at least one feeder line may feed the fluid to the pilot chamber. The detection line may extend from the pilot chamber to the wear detection circuit of the contact strip.


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